| abstract |
[PROBLEMS] To provide a photosensitive resin composition having high resolution and high sensitivity while having the same film characteristics as a conventional polyimide resin, and to provide a positive pattern forming method using the resin composition. With the goal. An imide compound represented by the following general formula (I): (Wherein, R 1 is a divalent organic group comprising the same or different aromatic groups having one or two hydroxyl groups, and R 2 is a tetravalent organic group comprising an aliphatic group or an aromatic group. R 3 is a divalent organic group having the same or different unsaturated bond, and n is an integer of 1 to 10.) and (B) 2 or more CH 2 ＣＨCH—O— groups A photosensitive resin composition comprising: a vinyl ether compound having the formula: (C) a photosensitizer which generates an acid by actinic rays; (D) a crosslinking agent; and (E) a solvent. . [Selection diagram] None |