| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d9f3ca41550d315642580237250c5b0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-60 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-04 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-40 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-24 |
| filingDate |
2003-11-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfc2c5597caabdb66e2f1ba076b15117
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d18de63396734054515b83f0cc9b6cb9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6569a5f118eae9ef4e263437d6ecb165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c00ffceca1aa3c03371ad4befe6cc3a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03e5bff312f1e5876edcfdce23931f86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9279266c24dcc6646c1087bfa4b71c5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_853762e0b9def2ecbe76189cd406c7b5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_451923622d39101813fba3425f733845 |
| publicationDate |
2004-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004190130-A |
| titleOfInvention |
System for forming pattern deposition from compressed fluid in a dual controlled deposition chamber |
| abstract |
The present invention provides a coating deposition system that enables pattern deposition of thermally unstable / variable materials. The system forms a patterned vapor deposition on a substrate from a compressed fluid. The supply system 12 cooperates with a first independent control chamber and a second independent control chamber that hold the substrate 14 and receives the precipitation functional material from the supply system 12 via the fluid flow supply 13. The shadow mask 22 is positioned very close to the substrate 14 to form a pattern deposition on the substrate 14. [Selection diagram] Fig. 1 |
| priorityDate |
2002-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |