http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004189629-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_33dafb5bbc2ec47ebcb7becbbe60f704 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D307-89 |
filingDate | 2002-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f1c295e59534a55aea1e8ea08b01bc0d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f4c97dd971e95a6ab2dec9807ce0d535 |
publicationDate | 2004-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2004189629-A |
titleOfInvention | Purification method of monomer for resist |
abstract | An object of the present invention is to provide a resist monomer having an extremely small metal content by easily and effectively reducing impurities from a crude resist monomer obtained through a reaction using a borohydride salt. SOLUTION: In the purification of a crude monomer for a resist obtained through a reaction using a borohydride salt, the crude monomer is washed with an aqueous solution containing amines, then washed with ion-exchanged water or distilled water, and then adsorbed. A method for purifying a resist monomer, characterized by treating with a chemical. [Selection diagram] None |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005255586-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005255584-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005255583-A |
priorityDate | 2002-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.