http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004186593-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate | 2002-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f9fe86738e92f44c48d2cf5fa1a39540 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcf4340e8e1ff85fa9d0b70f31ac4cc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad60b78d1616f3cba147e2333490c4a0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e101f0deabbdb6fc5ec5b6b6b9a803c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99bdff9aa47d25894f4e6e415f25ea71 |
| publicationDate | 2004-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004186593-A |
| titleOfInvention | Low dielectric constant insulating film, method of manufacturing the same, and semiconductor device |
| abstract | A low-dielectric-constant insulating film capable of forming a high-strength, low-dielectric-constant insulating film, a method for manufacturing the same, and a semiconductor device using the low-dielectric-constant insulating film. A siloxane resin film forming step of forming a siloxane resin film by applying a low dielectric constant insulating film forming material containing a siloxane resin on a substrate, and making the surface of the siloxane resin film hydrophilic with a surface treatment liquid. And a baking step of baking the siloxane resin film subjected to the surface treatment. An embodiment in which the surface treatment liquid is selected from an organic solvent having a hydroxyl group and an aqueous solution having a pH of 1 to 10, an embodiment in which, before the surface treatment step, an insolubilization treatment in which the siloxane resin film is heat-treated to insolubilize the surface treatment liquid, and the like are preferable. . [Selection diagram] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010003761-A |
| priorityDate | 2002-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.