| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_be055db3c1a09879df07379ba969e223
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-235
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02203
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-23
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D183-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2002-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9eb54e35c20e43243e03589ef0e039f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72b0495e777552ef742b98013cbdb2c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba96a53d694dffda99693c0c5d0a5f4c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1adcdf5a44f93370adac07a22ba731a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_027e2ccf1876b7e00d9f78756f87e0f2 |
| publicationDate |
2004-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004161876-A |
| titleOfInvention |
Composition for forming porous film, porous film and manufacturing method thereof, interlayer insulating film, and semiconductor device |
| abstract |
A film forming composition capable of forming a porous film having practical mechanical strength in a simple process and at low cost, a porous film and a method for producing the same, and a low-cost, high-cost built-in porous film Provided is a semiconductor device with high performance and high reliability. A polymer obtained by hydrolyzing and condensing one or more silane compounds represented by the following general formula (1), preferably one or more silane compounds represented by the following general formula (1): A composition for forming a porous film containing a polymer obtained by cohydrolyzing and condensing one or more silane compounds represented by the general formula (2) is used. In addition, a method for producing a porous film including a step of applying the composition for forming a film and a step of forming a porous film is used. Embedded image [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010082414-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007094347-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016114061-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013216895-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016114061-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018178011-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010512453-A |
| priorityDate |
2002-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |