| abstract |
Provided is a positive resist composition that exhibits sufficient transparency when using a light source of 160 nm or less, specifically F 2 excimer laser light (157 nm), and has few development defects. (A) A resin having a specific repeating unit, the solubility of which is improved in an alkaline aqueous solution by the action of an acid, (B) A positive resist composition comprising a compound that generates an acid by the action of actinic rays or radiation, and (C) a solvent. [Selection figure] None |