http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004143568-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cdd94f212dc7aef02fc1dcf28fa9b4fd |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G83-00 |
| filingDate | 2002-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a602ba55b7a8a4b761a7e27ffbc5e703 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c49df66b855f15a0bfb9a9a155e7c93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e81c27e5ebc926dc51c3e0e79f258c66 |
| publicationDate | 2004-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004143568-A |
| titleOfInvention | Thin film forming equipment |
| abstract | An object of the present invention is to provide a thin film forming apparatus that suppresses contamination on a discharge surface of an electrode. A discharge space in which a first electrode and a second electrode are opposed to each other, voltage applying means for applying a high-frequency voltage between the first electrode and the second electrode, a reactive gas and a reactive gas in the discharge space. Gas introducing means for introducing a discharge gas, and applying a voltage from the voltage applying means under atmospheric pressure or a pressure near the atmospheric pressure, to activate the reactive gas introduced into the discharge space A thin film forming apparatus for forming a film on a substrate disposed on the second electrode, wherein the discharge gas contains 50 to 100% by volume of nitrogen gas, and a discharge surface of the first electrode is formed. Is configured not to directly contact the reactive gas. [Selection diagram] Fig. 1 |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006286325-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009263778-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4495023-B2 |
| priorityDate | 2002-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 76.