http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004138892-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2002-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bcbffcb64a5670ed86f001e8cc9bc95e |
| publicationDate | 2004-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004138892-A |
| titleOfInvention | Positive resist composition |
| abstract | Provided is a positive resist composition in which occurrence of pattern collapse is small even in the formation of a fine pattern. (A) A resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and having increased solubility in an alkali developer by the action of an acid; (B) a compound that generates an acid upon irradiation with actinic rays or radiation, (C) an amine compound having a bridged polycyclic structure, and (D) A positive resist composition containing a solvent. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015159830-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10261417-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2017038685-A1 |
| priorityDate | 2002-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 268.