| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad78b36d08c20f06075145cc1caf3ac8 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C31-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F5-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-00 |
| filingDate |
2002-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbb706e19c6ded17e62f9e61699d8a1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_337ab1ace3fa9d34928b07c37f3f3ce8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67f9b63491d3f40556331d6efc04c882
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24ab47332535b9264891b218293d300f |
| publicationDate |
2004-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004137223-A |
| titleOfInvention |
Novel compound, raw material for chemical vapor deposition containing the same and method for producing thin film |
| abstract |
Provided are a compound suitable for producing a thin film containing hafnium atoms and aluminum atoms by a CVD method, a CVD raw material containing the compound, and a method for producing a thin film by a CVD method using the raw material. A compound represented by the following general formula (I). Embedded image [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013522878-A |
| priorityDate |
2002-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |