| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0751
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F291-06 |
| filingDate |
2003-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ead7916920dcb3780c075742573b5e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80ee43e8cc0e71ade51ca84155bbf997
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad539b3f37f00db8e65e59df806c7999
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbc4d1bb38c43a9cd1030843a2ff5126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93ef10e16dc81cd91295b3fdeb989360 |
| publicationDate |
2004-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004126600-A |
| titleOfInvention |
Photosensitive resin composition for controlling dissolution characteristics and method for forming two-layer structure pattern using the same |
| abstract |
PROBLEM TO BE SOLVED: To provide a new photosensitive resin composition capable of adjusting dissolution characteristics and a method of forming a two-layer structure pattern using the same, and sequentially from a lower layer to an upper layer regardless of the film thickness. Gives a degree of cure, and is dissolved step by step from the upper layer of the film with a low degree of cure during the development after unsaturated exposure, and is free from film peeling and undercut development due to chemical bonding between the substrate and the resin composition. Provided is a resin composition. SOLUTION: A gamma value (γ-value) can be adjusted by using a new photopolymerization initiator and a lower layer curing agent, and even after a small exposure energy, the pattern is not peeled off after development and is dissolved from the upper layer. The present invention relates to a photosensitive resin composition whose film thickness can be adjusted and which is useful as a color filter and an overcoat material in an LCD manufacturing process. [Selection diagram] Fig. 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I418859-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102015910-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4736992-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007094381-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007108275-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8670197-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010073798-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113621306-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102015910-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017090763-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4736692-B2 |
| priorityDate |
2002-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |