| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate |
2003-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19be4b14e48e0d3638730509757f3e87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f33c7a0d5428cba3ecb7e4a5f532327b |
| publicationDate |
2004-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004126509-A |
| titleOfInvention |
Solvent and photoresist composition for 193NM imaging |
| abstract |
A novel photoresist suitable for short-wavelength active radiation exposure imaging including a wavelength of 200 nm or less, particularly including 193 nm. A polymer having substantially no aromatic moiety, comprising, as a binder, a polymer compound having a photoacid labile repeating unit, and a photoactive component such as one or more photoacid generator compounds; A photosensitive composition containing one or more solvents such as methyl isoamyl ketone (5-methyl-2-hexanone) and other solvents such as propylene glycol methyl ether acetate and cyclohexanone. [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7338737-B2 |
| priorityDate |
2002-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |