| abstract |
An object of the present invention is to provide a polishing composition capable of reducing the amount of erosion. The polishing composition includes (A) colloidal silica of more than 50 g / l and 160 g / l or less, (B) at least one selected from periodic acid and a salt thereof, (C) ammonia, (D) ) Ammonium nitrate and (E) water are contained, and the pH is 1.8-4.0. And an insulator layer having a concave portion on the surface and a metal layer formed on the insulator layer and including a conductor layer formed of a conductor metal such as tungsten. At least the metal layer and the insulator layer It is configured to be used in a polishing step of finishing polishing of the steel. [Selection diagram] None |