http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004109850-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2002-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 |
| publicationDate | 2004-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004109850-A |
| titleOfInvention | Positive resist composition |
| abstract | An object of the present invention is to provide a positive resist composition suitable for use with an exposure light source of 160 nm or less, particularly F 2 excimer laser light (157 nm). And a positive resist composition having less line edge roughness, development defects and scum. A positive resist composition comprising a compound having a specific aromatic or aliphatic ring structure having two norbornene rings having a group capable of decomposing under the action of an acid to generate a carboxylic acid. Stuff. [Selection figure] None |
| priorityDate | 2002-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 199.