http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004109341-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
| filingDate | 2002-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e1b82acdc847e628742b17dc88ca0eae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34ec45d6fef6983b79c452f4889637b3 |
| publicationDate | 2004-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004109341-A |
| titleOfInvention | Light-shielding image forming method and color filter |
| abstract | A method for forming a light-shielding image on a transparent substrate in a non-pixel portion of a color image using a light-shielding photosensitive resin composition, and a color filter with improved display contrast, which is produced by the formation method. A color image forming step for forming a color image composed of red, green and blue pixels on a transparent substrate, and a light-shielding photosensitive resin composition on a surface on which the color image is formed by the color image forming step. A light-shielding resin layer forming step of providing a light-shielding resin layer comprising: a light-shielding resin layer exposure step of exposing the light-shielding resin layer through the transparent substrate; and a color formed in the color image forming step by performing development processing A light-shielding image forming step of forming a light-shielding image on a transparent substrate in a non-pixel portion of the image, and the exposure of the transparent substrate in the light-shielding resin layer exposure step in a range of 40 ° C. or higher and lower than 130 ° C. After the step, the temperature of the transparent substrate before the development processing is set to a range of 40 ° C. or more and less than 130 ° C. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013002201-A1 |
| priorityDate | 2002-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 326.