| abstract |
The present invention provides a novel acid generator, particularly an acid generator capable of providing a resist composition excellent in sensitivity, resolution and profile. An acid generator which generates an acid upon irradiation with actinic rays or radiation, and which contains a specific compound (for example, Formula 1, Formula 2) having a ring structure and a group having —OSO 2 — at the terminal. Agent, and photosensitive composition using the same. [Selection figure] None |