http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004093768-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F16-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 2002-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 |
| publicationDate | 2004-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004093768-A |
| titleOfInvention | Positive resist composition |
| abstract | An object of the present invention is to provide a positive resist composition suitable for use with an exposure light source of 160 nm or less, particularly F 2 excimer laser light (157 nm). It is another object of the present invention to provide a positive resist composition having improved line edge roughness, development defects, and heat resistance of a resist pattern formed on a substrate. SOLUTION: (A) A compound capable of generating an acid upon irradiation with actinic rays or radiation, and (B) a specific crosslinking repeating unit as at least one of repeating units, solubility in an alkali developer by the action of an acid. A positive resist composition comprising a cross-linked resin having an increased viscosity. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11036133-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020124961-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11681222-B2 |
| priorityDate | 2002-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 204.