http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004085984-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7c1762eac0a0b717b3186e45cc0ded7e |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
filingDate | 2002-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f42c40d0eacf55093532fb55c56ce27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab25ac1d891c240f00e7013b59085699 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f0edb945b5c2e30a80cb81db70580ae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85af5fda458d94b17b1d402b23033e93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a8f8ff811a305ce04a47b4663795f37 |
publicationDate | 2004-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2004085984-A |
titleOfInvention | Photocurable composition, photosensitive thermosetting resin composition, and cured product thereof |
abstract | A photocurable composition, a photosensitive thermosetting resin composition, and a cured product thereof, which provide a cured product having excellent flexibility and heat resistance. A compound (A) obtained by reacting an epoxy compound represented by the following general formula (1) and / or (2) with a monocarboxylic acid having an unsaturated group and then reacting with a polybasic anhydride. ) And an epoxy compound represented by the following general formula (3) are reacted with an unsaturated group-containing monocarboxylic acid or polybasic acid anhydride in the same manner as in (A) to obtain a compound (B) having a double bond equivalent of: 600-2000 g / eq. A photosensitive thermosetting resin composition comprising a mixture photocurable composition, which is an epoxy compound (C), a photopolymerization initiator (D), and a diluent (E). (Where M is -H or X and Y are the same or different divalent aromatic residues, and l represents 1 to 20) (Wherein, R represents —H or CH 3 , and m represents 1 to 20) (Wherein X and Y are the same or different divalent aromatic residues, and l represents 1 to 20) [Selection diagram] None. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2013024844-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7192521-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020117613-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010007859-A1 |
priorityDate | 2002-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 151.