http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004079550-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-02
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J29-04
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filingDate 2003-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d62675daf345f57e5625e05d93d51cc9
publicationDate 2004-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2004079550-A
titleOfInvention Method of manufacturing electron source substrate, electron source substrate manufactured by the method, and image display device using the substrate
abstract Provided is an electron source substrate manufacturing method for forming a surface-conduction type electron-emitting device with a small number of steps, a stable yield, and a low cost by an ink-jet droplet applying method. An electron-emitting device group is formed by applying liquid droplets between device electrodes, and further, regions Xa, Xb, Ya, and Yb other than region X and region Y, which are electron-emitting device group formation regions, that is, electrons A small space is also provided outside the emission element group formation region, and a plurality of similar pairs of element electrodes are formed there, and a droplet of a solution containing a conductive thin film material is sprayed between the element electrodes. Thereby, a pattern of the device electrode and the conductive thin film similar to the electron-emitting device is formed (here, the pattern is provided at four corners). With the device electrodes and the conductive thin film pattern formed outside the electron-emitting device group formation region, the function of the device when the electron-emitting portion is formed by the forming process is checked. [Selection diagram] FIG.
priorityDate 2003-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.