| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2003-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_97d22f509fa1bd2a3c3248424048d070
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b7336f7001b3f013cf2e9447a528afd0 |
| publicationDate |
2004-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004078245-A |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of forming a resist pattern having a high resolution and a high aspect ratio. SOLUTION: The composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one ethylenically unsaturated bond in a molecule, (C) a photopolymerization initiator, and (E) a leuco dye. The amount of the component (E) is 0.3 to 0.6 parts by weight based on 100 parts by weight of the total of the components (A) and (B). [Selection diagram] None |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007286477-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007304541-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007040204-A1 |
| priorityDate |
2000-09-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |