http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004062045-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F28-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2002-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 |
| publicationDate | 2004-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004062045-A |
| titleOfInvention | Positive resist composition |
| abstract | An object of the present invention is to provide a positive resist composition suitable for use with an exposure light source of 160 nm or less, particularly F 2 excimer laser light (157 nm). And a positive resist composition having less line edge roughness, development defects and scum. (A) a resin containing a repeating unit having a —SO 2 — structure in the side chain, which is decomposed by the action of an acid to increase the solubility in an alkali developer, and (B) an actinic ray or radiation A positive resist composition comprising a compound capable of generating an acid upon irradiation. [Selection figure] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015241771-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008521039-A |
| priorityDate | 2002-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 208.