http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004046206-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2003-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b371d878503af0da2b50566aef90ca7d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d7553b249b3632974346bc3d101edca http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dbedb1a5039de4a4d2212c916ad759ca |
| publicationDate | 2004-02-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004046206-A |
| titleOfInvention | Chemically amplified photoresist composition, acrylic acid or methacrylic acid ester copolymer used for the same, and acrylic acid or methacrylic acid ester used for producing the copolymer |
| abstract | Kind Code: A1 A chemistry that has high transparency to an ArF excimer laser, exhibits excellent sensitivity, resist pattern shape, dry etching resistance and adhesion, has a high affinity for alkali, and can provide a good resist pattern by paddle development. An amplified photoresist composition is provided. In a positive resist composition containing (A) an acrylic resin whose solubility in an alkali is changed by the action of an acid and (B) an acid generator, the component (A) has at least a part of its constituent units. As a general formula (R 1 is a hydrogen atom or a methyl group) A chemically amplified photoresist composition which is an acrylic acid or methacrylic acid ester copolymer having the structural unit represented by [Selection diagram] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-5118622-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8105746-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8541606-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8492562-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100117064-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101443394-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007094474-A1 |
| priorityDate | 2003-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 150.