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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-812
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-778
filingDate 2002-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21d9799f87afc7be7126d137ebe58a16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_524b3ecfab21f457030227b4e85bc8e8
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publicationDate 2004-01-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2004031652-A
titleOfInvention Heterojunction field effect transistor
abstract An object of the present invention is to form a planar doped layer of carbon having a steep impurity distribution in a vertical direction to effectively prevent deterioration of device characteristics due to diffusion of a dopant. A spacer layer (105) and a Schottky junction forming layer (107) constituting a part of a barrier layer are formed from an undoped compound semiconductor layer (InP, GaP, AlP, etc.) containing P as a component element. Then, a carbon planar doped layer (106) is formed on the surface of the spacer layer (105) in contact with the Schottky junction forming layer (107). [Selection diagram] Fig. 1
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009060043-A
priorityDate 2002-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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