| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cdd94f212dc7aef02fc1dcf28fa9b4fd |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50 |
| filingDate |
2002-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b3571908500efd862848076d0012ecd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e81c27e5ebc926dc51c3e0e79f258c66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d1417d46e6f7febba3aa7e22133820f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b22baed58f1136728786908958a79882 |
| publicationDate |
2004-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2004018998-A |
| titleOfInvention |
Plasma discharge processing equipment |
| abstract |
An object of the present invention is to provide a plasma discharge processing apparatus capable of improving workability of a cleaning operation and efficiently forming a thin film. A plasma discharge processing apparatus according to the present invention ejects a reactive gas to the outside from between opposing electrodes under an atmospheric pressure or a pressure near the atmospheric pressure, and discharges the reactive gas into a plasma state. A cleaning gas is introduced between the electrodes of the other gas ejecting means that is not performing the film forming operation during the film forming operation by the at least one gas ejecting means. A cleaning operation for removing deposits attached to the electrodes is performed. [Selection diagram] Fig. 1 |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005252089-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008174826-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014133915-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009126827-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4498774-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009126827-A3 |
| priorityDate |
2002-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |