http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004014623-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B57-02 |
| filingDate | 2002-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a62e623241ff93b545ef70d651e1079 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79209daf1e029386f874e147c948ac1e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e9c96ce53d0a1126128bae1b4813468 |
| publicationDate | 2004-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2004014623-A |
| titleOfInvention | Polishing liquid for metal and polishing method using the same |
| abstract | An object of the present invention is to provide a polishing slurry for metal and a polishing method using the same, which exhibit a high CMP rate and can form a highly reliable embedded pattern. A metal polishing solution containing a metal oxidizing agent, a metal oxide dissolving agent, a protective film forming agent, an antioxidant, a water-soluble polymer and water. Polishing the film to be polished by moving the polishing platen and the substrate relatively while the substrate having the film to be polished is pressed against the polishing cloth while supplying the metal polishing liquid on the polishing cloth of the polishing platen. Polishing method. [Selection diagram] None |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015195391-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009530848-A |
| priorityDate | 2002-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 218.