| abstract |
An object of the present invention is to provide a gas / steam barrier film having higher gas / steam barrier performance and higher transparency than before, and also having excellent surface smoothness. A gas / water vapor barrier film characterized in that at least one surface of a polymer film has an inorganic layer whose surface smoothness is improved by lowering sputtering power. Arithmetic average surface roughness (Ra) of the inorganic layer is Ra <10 nm, maximum height (Ry) is Ry <0.3 μm, and depth from the average line is 10 nm or more. A barrier film having no holes with a ratio (hole depth / hole diameter) larger than 0.2, and two protrusions having a height of Ra ≦ 1 nm and a height of 10 nm or more from an average line in a region of 20 μm × 20 μm square. Hereinafter, an inorganic layer having no hole with a depth of 10 nm or more from the average line is laminated as the outermost layer. Further, in the inorganic layer, it is preferable that a region having a height of 10 nm or more from the average line is 0.1% or less in a region of 20 μm × 20 μm. |