| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0426
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0256
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2291-0212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S95-90
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04C2003-0491
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04B2001-249
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04B2001-2439
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04B2001-2415 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-685
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-564
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/E04B1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N29-036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/E04C3-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N29-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-317
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-82
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-56
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/E04B1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-40 |
| filingDate |
1999-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2003-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003529888-A |
| titleOfInvention |
Integrated ion implantation cleaning system |
| abstract |
(57) Abstract: An ion implantation process apparatus including an ion implantation apparatus (110) for performing an ion implantation process. A supply source gas for the ion implantation process is arranged to flow into the ion implanter (110) and exits an effluent gas stream containing ionization products of the source gas during the ion implantation process. The apparatus includes a runoff reduction device (114, 126) for eliminating harmful runoff species from the effluent gas stream. The source gas is supplied from a reduced pressure gas source in which the source gas is adsorbedly held in a container on an adsorbent having an affinity for the source gas and is desorbed for dispensing to the processing apparatus. Is done. The novel cleaning composition is used for effluent treatment and the flow of said cleanable component through said cleaning composition is monitored with an apparatus such as a quartz crystal microbalance monitor (550). |
| priorityDate |
1998-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |