http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003525979-A

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filingDate 2001-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2003-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003525979-A
titleOfInvention Plasma polymerization processing system and plasma polymerization processing method
abstract (57) [Summary] The present invention is a plasma polymerization processing system provided with one or more polymerization chambers, in which a reactive gas is injected into a polymerization chamber to generate plasma by high-voltage discharge, and a surface of a substrate is produced. And a step of injecting a mixed gas of oxygen and nitrogen to generate plasma by high-voltage discharge in order to suppress a change in the characteristics of the surface of the base material on which the polymer is deposited by the polymerization treatment. And a step of sequentially enhancing the properties of the material surface. Air can be used as the mixed gas of oxygen and nitrogen.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015188895-A
priorityDate 2000-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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