| abstract |
(57) [Summary]nProvided is a fluoro-substituted silsesquioxane thin film precursor having a structure in which a fluoro group is bonded to a silicon atom of a silsesquioxane cage. In a first aspect, the present invention provides a compound of the formula: [F-SiO 1.5 ] x [H-SiO 1.5 ] y Wherein x + y is n, n is an integer from 2 to 30, x is an integer from 1 to n, and y is a natural number from 0 to n. I do. Also provided are films made from the precursors and articles comprising the films. |