abstract |
(57) [Problem] To form an extremely fine photoresist pattern using a photoresist corresponding to an ArF excimer laser, Provided is a coating liquid composition for forming an upper antireflection film having an excellent effect of improving the shape of a pattern head. A coating solution composition for forming an antireflection film laminated on a positive photoresist layer compatible with an ArF excimer laser, comprising: (a) a water-soluble film forming component; (B) C 4 or more perfluoroalkyl carboxylic acids, C 5 At least one fluorine-based compound among the above perfluoroalkylsulfonic acids, (c) (c-1) a C1-4 fluoroalkylsulfonic acid, and / or (c-2) An acidic compound comprising a C 1-4 hydrocarbon in which one or more hydrogen atoms are substituted with a fluoroalkylsulfonyl group (one or more carbon atoms in the hydrocarbon group may be substituted with a nitrogen atom) A coating composition for forming an antireflection film, a photoresist laminate using the composition, and a method for forming a photoresist pattern. |