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filingDate 2002-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33398195ccd1af527b1552705f130c2a
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publicationDate 2003-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003324090-A
titleOfInvention Substrate processing equipment
abstract (57) [PROBLEMS] To perform processing by supplying a processing liquid to one surface of a substrate while rotating the substrate, thereby effectively preventing the processing liquid mist from being caught in the other surface of the substrate, and Provided is a substrate processing apparatus capable of surely controlling the flow of a liquid. A substrate W is held from above by an atmosphere shielding part 60 by using the Bernoulli effect. A rotation transmitting member 6 for transmitting the rotation of the atmosphere shielding portion 60 to the substrate W from the shielding surface 61 of the atmosphere shielding portion 60. 8A and a position restricting member that restricts the horizontal movement of the substrate W protrudes. The rotation transmitting member 68 and the position regulating member are provided on the peripheral edge of the shielding surface 61 at intervals in the rotation direction of the atmosphere shielding portion 60. The rotation transmitting member 68 faces the peripheral edge of the upper surface of the substrate W, and the position regulating member faces the peripheral end surface of the substrate W.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7207769-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010537442-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102741997-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102314554-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113400176-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/IT-UD20100014-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014103405-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7503978-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2021130192-A
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