abstract |
[PROBLEMS] To provide a positive resist composition having a sufficient transmittance when using a light source of 160 nm or less, specifically F 2 excimer laser light (157 nm), and excellent in sensitivity and contrast. That is. A positive resist composition containing an acid-decomposable resin containing a repeating unit represented by the following general formula (I) and having increased solubility in an alkaline developer by the action of an acid. [Chemical 1] In the formula, R (I) -1 to R (I) -3 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a cyano group or an alkyl group which may have a substituent. . L 1 represents a divalent linking group. Z represents an acid-decomposable group. |