| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8e43b4ca6b41ce9f54c9a895d474c81a |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D163-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-04 |
| filingDate |
2002-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a1f3c8b3f9e81a9b988aa850abf54a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4832c29ddc709d37831d79008cc6b24 |
| publicationDate |
2003-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003306518-A |
| titleOfInvention |
Photosensitive resin composition and film having cured film thereof |
| abstract |
(57) [Summary] [Problem] Good adhesion to a film and scratch resistance, Provided are a photosensitive resin composition suitable for a hard coat for improving pencil hardness and a film having a cured film thereof. A compound (A) having at least two or more ethylenically unsaturated groups in the molecule and at least two compounds in the molecule. Photosensitive resin containing oligomer (B) obtained by reacting epoxy resin (a) having two or more epoxy groups with monocarboxylic acid (b) containing an ethylenically unsaturated group and photopolymerization initiator (C) Composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018184535-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010173234-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013077307-A1 |
| priorityDate |
2002-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |