http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003297262-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13aa7b32ae00ed83af7dfaa0b6a1f7c2 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J11-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J29-88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J9-20 |
| filingDate | 2002-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6eee01f98cd2bf8fccb4c09a2180fb18 |
| publicationDate | 2003-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003297262-A |
| titleOfInvention | Thin film, thin film forming method, and antireflection film |
| abstract | (57) [Problem] To provide a thin film, a thin film forming method, and an antireflection film capable of achieving both low refractive index and scratch resistance. SOLUTION: A thin film formed on a base material has fine irregularities on an outermost surface layer, and an average interval of irregularities defined by JIS B0601 is 10 nm or more and 400 nm or less, In addition, the arithmetic average roughness is 10 nm or more and 100 nm or less. |
| priorityDate | 2002-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 106.