Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F16-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G83-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F22-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-10 |
filingDate |
2002-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d338fa9da212910df6f0916095817b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02e7d4be09617b434643ed5c6772dc5e |
publicationDate |
2003-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2003295456-A |
titleOfInvention |
Antireflection film forming composition |
abstract |
(57) Abstract: A composition for forming an antireflection film which has a high antireflection effect and does not cause intermixing with a resist layer and can be used in a lithography process using irradiation light of an F2 excimer laser (wavelength: 157 nm). To provide. SOLUTION: An antireflection film-forming composition which can be used in a lithography process for manufacturing a semiconductor device, comprising a polymer compound containing a carbon-carbon triple bond. The polymer compound has a carbon-carbon triple bond introduced into a main chain and / or a side chain connected to the main chain. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009014816-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4639915-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009084490-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007114245-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006285046-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009230151-A |
priorityDate |
2002-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |