http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003295455-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G85-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate | 2002-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_27014e252d3d3b9b91be887e65d63597 |
| publicationDate | 2003-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003295455-A |
| titleOfInvention | Photosensitive composition |
| abstract | [PROBLEMS] To provide a negative photosensitive composition which is excellent in dry etching resistance and can form a resist film which is not easily cracked when forming a pattern. The negative photosensitive composition comprises the following (A) to (D). (A) A polyorganosiloxane resin containing an oxiranyl group or an oxetanyl group. (B) An alkali-soluble polyorganosiloxane resin containing an oxiranyl group or an oxetanyl group and containing a carboxyalkyl group or a hydroxyphenyl group. (C) a polyorganosiloxane resin having a hydroxyl group. (D) a compound that generates an acid by electromagnetic radiation or heat. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010160455-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11561472-B2 |
| priorityDate | 2002-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 123.