http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003293137-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ad78b36d08c20f06075145cc1caf3ac8 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 |
| filingDate | 2002-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85e6923b7472d4098578ff972ac4e1a5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e042cb23ac17d636873b01873e460f5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_065e3175c2b01520cae16f16132e0dc2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bbb706e19c6ded17e62f9e61699d8a1d |
| publicationDate | 2003-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003293137-A |
| titleOfInvention | Raw material for chemical vapor deposition and method for producing thin film using the raw material |
| abstract | PROBLEM TO BE SOLVED: To provide a raw material for chemical vapor deposition comprising a mixture of a tantalum compound and a titanium compound, and tantalum oxide added with titanium atoms by a chemical vapor deposition method using the raw material for chemical vapor deposition To provide a method for producing a thin film. SOLUTION: The tantalum compound represented by the following general formula (I), the titanium compound represented by the following general formula (II) and an organic solvent used as required, wherein the tantalum compound and the titanium compound A raw material for chemical vapor deposition having a difference in thermal oxidative decomposition temperature of less than 50 ° C. in absolute value. Embedded image |
| priorityDate | 2002-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 104.