| abstract |
(57) [PROBLEMS] A solid CV remaining in a vaporizer after a raw material obtained by dissolving a solid CVD raw material in an organic solvent is vaporized and supplied from a vaporization supplying device to a semiconductor manufacturing device, and the semiconductor production is completed. D raw material, heating product from solid CVD raw material, solid CVD raw material remaining in the semiconductor manufacturing equipment, and the reaction residue can be easily prepared in a short time without removing the vaporizer, the semiconductor manufacturing equipment, etc. from the vaporizing supply device. The present invention provides a vaporizer and a method for cleaning a semiconductor manufacturing apparatus, which can be removed. SOLUTION: A solid C is used in a vaporizer and a semiconductor manufacturing apparatus. Washing is carried out with the vapor of the organic solvent used for dissolving the VD raw material, and the washing residue is removed by at least one means selected from introduction of a dry gas, reduced pressure, and heating. |