http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003282430-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02cfb0f1aa2718c61bdf184d53adfe79 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2003-01-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c66757b344385ac7d11f339283e54be4 |
| publicationDate | 2003-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003282430-A |
| titleOfInvention | Exposure apparatus, exposure method, device manufacturing method, measurement method, and measurement apparatus |
| abstract | (57) [Problem] To accurately transfer a mask pattern onto a substrate without being affected by fluctuations in optical characteristics of laser light. SOLUTION: A laser optical characteristic measuring device (16c, 16) e), the laser light LB generated by the laser resonator (16a) is received and its optical characteristics are measured, Information on the optical characteristics is output. Then, at the time of exposure, the main controller 50 controls the integrated energy amount of laser light (substrate exposure amount) applied to the substrate based on the information at the time of exposure. Therefore, the exposure amount of the substrate is adjusted according to the optical characteristics of the laser light. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2014030645-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2014030645-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2023135773-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006041524-A |
| priorityDate | 2002-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.