| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-11 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2002-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4c704bfe3c1049d29339c5ac4741992
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0806ad1e19c2fad0b33a56cea7d2b8b0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09521f83d38851f78247fe772e2cf219 |
| publicationDate |
2003-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003280198-A |
| titleOfInvention |
Chemically amplified positive resist composition |
| abstract |
(57) [Problem] To provide a chemically amplified positive resist composition capable of improving basic performance such as sensitivity and resolution, particularly isolation resolution without lowering the residual film ratio. (A) A phenol which is itself insoluble or hardly soluble in an aqueous alkali solution, but has a protecting group which can be cleaved by the action of an acid, and becomes soluble in an aqueous alkali solution after the protecting group is cleaved. A chemically amplified positive type resin comprising: a resin having a skeleton; (B) a resin in which a part of the hydroxyl group of poly (p-hydroxystyrene) is protected by a pivaloyl group; and (C) an acid generator. Resist composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20100028000-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101636569-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8476473-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007114431-A |
| priorityDate |
2002-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |