http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003270790-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2002-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1826cb53e8e5226054260a30aabfebb1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_201abdae12f920f7b848ecd29a09137f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_011a1a34e0710f341a81c9dd1d273ea7 |
| publicationDate | 2003-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003270790-A |
| titleOfInvention | Positive resist composition |
| abstract | (57) [Summary] (With correction) [PROBLEMS] To provide sufficient transparency when using an exposure light source of 160 nm or less, specifically F 2 excimer laser light (157 nm), and improve line edge roughness and development defects. A positive resist composition is provided. (A) A compound that generates an acid upon irradiation with actinic rays or radiation, (B) the following general formulas (I) to (I) At least one repeating structural unit selected from the group of repeating structural units represented by (II), and the following general formula (I A positive resist composition comprising an organic fluoropolymer having a repeating structural unit represented by II), which increases the solubility in an alkali developer by the action of an acid, and (C) a solvent. In the general formula (I), R 11 to R 16 may be the same or different and each represents a hydrogen atom, a fluorine atom or a fluoroalkyl group. X 1 represents a group that is decomposed by the action of an acid. In the general formula (II), R 3 represents a hydrogen atom or a group capable of leaving by the action of an acid. In the general formula (III), R 1 represents a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a cyano group or a trifluoromethyl group. R 41 to R 46 represent a hydrogen atom, a fluorine atom or a fluoroalkyl group. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7407734-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2005040921-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7879528-B2 |
| priorityDate | 2002-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 176.