| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F12-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-30 |
| filingDate |
2002-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cb048b86304949d908d7c33ed66073c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 |
| publicationDate |
2003-09-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003270779-A |
| titleOfInvention |
Negative resist composition |
| abstract |
[Problem] To provide a negative resist composition that simultaneously satisfies the characteristics of sensitivity, resolution, pattern shape, and line edge roughness with respect to the use of an electron beam or X-ray. SOLUTION: (A) Alkali-soluble polymer, (B) A negative resist composition comprising a crosslinking agent that crosslinks with the alkali-soluble polymer (A) by the action of an acid and (C) a specific acid generator that generates an acid upon irradiation with actinic rays or radiation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011128276-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006307179-A |
| priorityDate |
2002-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |