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filingDate 2002-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7e2638e2b3a407a6546282e464b0d35
publicationDate 2003-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003249684-A
titleOfInvention Growth substrate for nitride semiconductor, nitride semiconductor light emitting device, and method of manufacturing the same
abstract (57) [Summary]nPROBLEM TO BE SOLVED: To provide a nitride semiconductor epitaxy with few crystal defects. Growth substrate for nitride semiconductors capable of growing Nitride Semiconductor Light Emitting Device Using Plate and Light Emitting Device To provide a method for manufacturing the same.nSOLUTION: A general formula (La) having a (111) plane as a main surface. a Sr 1-a ) (Al b Ta 1-b ) O 3 (0 <a <1, A single crystal of a composite oxide represented by 0 <b <1). Nitride film or Si film formed by nitriding the main surface A nitride semiconductor growth substrate having a C film is used.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103296158-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103296066-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012106907-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008034510-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105977138-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017008369-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019218729-A1
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Total number of triples: 38.