| abstract |
(57) [Summary]nPROBLEM TO BE SOLVED: To form a substrate surface without corroding metal. SiO formed 2 And Si x N y Such as silicon-containing films Engraving can be suppressed to a practical level, and in a short time The resist residue on the substrate can be removed. A stripper having excellent pH stability is provided.nSOLUTION: (a) Fluorine such as ammonium fluoride Compound, (b) water-soluble organic solvent, (c) good buffer A buffer having a buffered pH range in any pH 5 or higher range, And (d) a stripping solution containing water. Also, the stripping solution is (E) ammonia water, alcohol amine , Hydroxylamines, polyalkylene polyamines , Piperazines, morpholines and other basic compounds It may be contained. |