abstract |
[PROBLEMS] To provide a ceramic substrate capable of giving a practically uniform temperature distribution to a surface of a ceramic substrate on which a semiconductor wafer is processed. SOLUTION: The ceramic substrate having an electric conductor on the surface or inside of the ceramic substrate, wherein the ceramic substrate contains oxygen, the ceramic substrate has a disk shape, the diameter exceeds 250 mm, and the thickness of the ceramic substrate exceeds 250 mm. Is 25mm A ceramic substrate characterized by the following. |