http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003223856-A

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J29-87
filingDate 2002-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_daef71aa57fe55ade680be3741d672a0
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publicationDate 2003-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003223856-A
titleOfInvention Electron beam device and spacer
abstract (57) [Summary] [PROBLEMS] To suppress changes in the trajectory of electrons near a spacer due to long-time driving. When the maximum inclination angle θ of the uneven slope on the surface of the spacer substrate 1 is larger than 80 °, a part where the substrate angle is equal to or more than 80 ° is partially formed when the high-resistance film 2 is formed. Occurs, and as a result, the resistance of the high-resistance film 2 increases, Charges accumulate on the spacer substrate 1 with long-time driving. Therefore, by setting the maximum inclination angle θ of the slope of the spacer forming the unevenness to 80 ° or less, it is possible to prevent an increase in the resistance of the spacer, so that the change in the electron trajectory due to long-time driving can be prevented. Suppression becomes possible.
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