abstract |
(57) [Problem] To provide a photosensitive resin composition capable of forming a resist pattern having a high resolution and a high aspect ratio. SOLUTION: The composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one ethylenically unsaturated bond in a molecule, and (C) a photopolymerization initiator. , N'-Tetraalkyl-4,4 ' -Diaminobenzophenone in an amount of 0.04 to 0.0 with respect to 100 parts by weight of the total amount of the components (A) and (B). The photosensitive resin composition contains 8 parts by weight. |