http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003215785-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_02cfb0f1aa2718c61bdf184d53adfe79
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-64
filingDate 2002-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54c05bf6200bd75857a8bfa007255fce
publicationDate 2003-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003215785-A
titleOfInvention Pattern protection apparatus, mask apparatus and manufacturing method thereof, exposure apparatus and exposure method, and device manufacturing method
abstract (57) [Summary] [PROBLEMS] To maintain exposure light transmittance favorably and stably. SOLUTION: A pattern protection material 75 is mounted on one surface, and the other surface is a mounting surface for a reticle substrate 54, and at least one opening 22A is formed on the frame 76; A pattern protection device including a lid member 26A capable of opening and closing the opening is attached to the reticle substrate. Therefore, dust is prevented from adhering to the pattern surface of the reticle substrate, and even after the pattern protection device is attached to the reticle substrate, the opening formed in the frame is opened, so that any At this point, the gas in the space surrounded by the pattern protection device and the reticle substrate can be replaced with a predetermined gas. That is, by opening the opening prior to exposure and replacing the gas in the space with a low-absorbing gas, the exposure light transmittance can be maintained satisfactorily and stably.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005316492-A
priorityDate 2002-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5360311
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569951
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453983601
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID224478
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451572542
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5416
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6432035
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID412483216

Total number of triples: 21.