http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003213065-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c62268de3e92657ca5b9adcac4778225 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L29-14 |
| filingDate | 2002-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3eddac3a6c3673c5a55843665023bf0e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dc81049582fdf7e018bdd59ca942d80 |
| publicationDate | 2003-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2003213065-A |
| titleOfInvention | Polyvinyl acetal resin composition for heat developable photosensitive material |
| abstract | (57) [Problem] For a heat-developable photosensitive material capable of improving the pot life of a pre-coating solution, the preservability of a raw film, fog, etc. and improving the sharpness of an image and a gradation part. A polyvinyl acetal resin is obtained. SOLUTION: This is a polyvinyl acetal resin synthesized by an acetalization reaction between polyvinyl alcohol and an aldehyde, wherein the degree of polymerization is in the range of 200 to 3000, the ratio of residual hydroxyl groups is in the range of 8 to 30% by mass, and the antioxidant is used. A polyvinyl acetal resin for a heat-developable photosensitive material containing 0.01 to 100 ppm. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005325342-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012005127-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018021149-A |
| priorityDate | 2002-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 117.