| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fec576c38e34882531ca37d6b922bf42 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F261-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2002-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1bd5be9be9815b72cbd96780937bd39d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a549d2b56fbabdf2cc6d01a236e3b138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40a1ac5b357e55548262a1e59476b10f |
| publicationDate |
2003-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2003212915-A |
| titleOfInvention |
Positive resist composition using fluorinated copolymer |
| abstract |
(57) [Summary] [PROBLEMS] From a novel fluorine-containing copolymer and an acid generator having high transparency from vacuum ultraviolet rays to the visible region, and having both adhesion to a substrate and high film-forming properties. A positive resist composition. An acrylic monomer having at least a fluoroalkyl group at the α-position represented by the general formula (1), and a fluorine-containing copolymer containing a vinyl ether represented by the general formula (2) as an essential component And a positive resist composition comprising an acid generator. Embedded image |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016062242-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4539847-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005321765-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9746775-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7479364-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7358027-B2 |
| priorityDate |
2002-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |