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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84
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filingDate 2002-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6e53bcaa7385229be594850214e6f063
publicationDate 2003-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2003211351-A
titleOfInvention How to reduce microprojections
abstract (57) [Summary] [Object] For finish polishing of a memory hard disk or polishing for a semiconductor element, the surface roughness of a polished object after polishing is small, and surface defects such as protrusions and polishing scratches, particularly atomic force. A method for reducing microprojections on a substrate to be polished, which can economically reduce microprojections detected by surface shape analysis using a microscope, a magnetic disk substrate obtained by using the method, and the method Provided is a method for manufacturing a substrate using the same. The composition contains water, an abrasive, and an acid compound. The method comprises the step of polishing a substrate to be polished using a polishing liquid composition in which H is acidic and the concentration of the polishing material is less than 10% by weight, and the surface is detected by surface analysis using an atomic force microscope (AFM). Method for reducing microprojections on polished substrate, substrate for magnetic disk obtained by using the method, and magnet with reduced microprojections detected by surface analysis using an atomic force microscope (AFM) using the method A method of manufacturing a disk substrate.
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